In plasma etching process it is critical to know when the film being etched has cleared to the underlying film, i.e. to detect endpoint, in order to achieve the desired device performance in the resulting integrated circuit. The most highly…

Continued advances in the semiconductor industry will require the introduction of new materials and processes concurrent with shrinking device dimensions. These simultaneous demands drastically reduce margins for error and necessitate an increasingly quantitative understanding of semiconductor processes. Leaders of the…

Gene expression arrays are a technology used to measure quantities of messenger ribonucleic acid (mRNA). Application of the technology involves a variety of physical processes beginning with the acquisition of mRNA samples and ending with the fluorescence imaging of a…

(cont.) of free methionine. Therefore, the environments surrounding different methionine sites in G-CSF mainly provide spatial restriction to the access to the solvent but do not affect oxidation in a specific manner, consistent with the good correlation between 2SWCN's and…

Despite recent progress in materials synthesis, there are few materials with narrow pore size distributions and well-defined pore structures in the size range of 100 - 500 A. Materials with pores of 100 - 500 A possess a potential combination…

This thesis developed and applied tools to bridge the gap between available data and action for urban air quality management, focusing on strategies to reduce particle concentrations. One of the principal thesis contributions is a Bayesian method to exploit the…