| Título: | Flexible Nanofabrication Equipment: E-beam Lithography System Based on SEM |
| Autores: |
Wei, Shuhua Dai, Lan Zhang, Jing |
| Fecha: | 2014-05-01 |
| Publicador: | TELKOMNIKA: Indonesian journal of electrical engineering |
| Fuente: |
 |
| Tipo: |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion |
| Tema: | No aplica |
| Descripción: | Electron beam lithography (EBL) is widely used in nano-scale device fabrication and research due to high resolution and excellent flexibility. In this paper, nanometer EBL system based on scanning electron microscope (SEM) is introduced. Its main components include a modified SEM, a laser interferometer controlled stage, a versatile high speed pattern generator, and a fully functional and easy-operational software system. In order to explain this EBL system design principle, realization method, this paper mainly introduces each component’s design basis, main structures and functions. Stitching experiments overlay experiments and arbitrary shape patterns exposure experiments have been done on this EBL system based on JSM-35CF SEM. The lithography results demonstrate that the resolution of electron beam lithography system can approach nanometer. This kind of EBL system based on SEM can meet the need of micro-nanofabrication research and design activities at flexibility and low price. |
| Idioma: | No aplica |