| Título: | Microstructure Related Characterization of a-Si:H Thin Films PECVD Deposited under Varied Hydrogen Dilution |
| Autores: |
Vavrunkova, Veronika Mullerova, Jarmila Sutta, Pavel |
| Fecha: | 2011-06-20 |
| Publicador: | Advances in Electrical and Electronic Engineering |
| Fuente: |
 |
| Tipo: |
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| Tema: | PECVD; hydrogen; Si-H bonds. |
| Descripción: | We report on the structure and optical properties of hydrogenated silicon thin films deposited by plasma - enhanced chemical vapor deposition (PECVD) from silane diluted with hydrogen in a wide dilution range. The samples deposited with dilutions below 30 were detected as amorphous hydrogenated silicon (a-Si:H) with crystalline grains of several nanometers in size which represent the medium-range order of a-Si:H. The optical characterization confirmed increasing ordering with the increasing dilution. The optical band gap was observed to be increasing function of the dilution. |
| Idioma: | Inglés |
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